Artikelaktionen
Scatterometry and ellipsometry on structured surfaces
| Datum |
Mittwoch,
18.03.2009
bis Donnerstag, 19.03.2009 |
|---|---|
| Ort | Braunschweig |
| Kontakt | Dr. Bernd Bodermann |
| scatterometry@ptb.de | |
| Telefon | +49 531 / 592 4222 |
| Termin zu Ihrem Kalendar hinzufügen |
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The Department "Imaging and Wave Optics" of the Physikalisch-Technische Bundesanstalt has the honour to invite you to attend the Workshop on Scatterometry and Ellipsometry on Structured Surfaces.
The aim of this seminar is to bring together experts in the special but expanding field of dimensional metrology on structured surfaces using scatterometry and related methods. Basic principles, methods and modelling will be discussed mainly for (but not limited to) applications in semiconductor industry.
An assortment of interesting talks presented by internationally acknowledged experts from tool suppliers, research institutes and operators will be offered. The seminar is intended for participants from industry, universities and research institutes including standard institutes.
DESCRIPTION
- dimensional metrology on structured surfaces using scatterometry and related methods
- applications in semiconductor industry and be-yond.
- discussion of basic principles, modelling, methods and applications
Early registration deadline: 31 December, 2008
Final registration deadline: 15 February, 2009
Speaker | Subject |
| B. Bodermannn, M. Wurm PTB, Germany | Non-imaging optical metrology of structured surfaces: Prospecs, Challenges and Limitations |
| E. Buhr, A. Diener PTB, Germany | Multi-wavelength VIS/UV optical diffractometer for high-accuracy calibration of nano-scale pitch standards |
| A. De Martino Ecole Polytechnique, France | Scatterometric applications of Mueller polarimetry in conical diffraction |
| V. Fererras Paz, K. Frenner, W. Osten University of Stuttgart, Germany | Sensitivity analysis and simulation based results of extendabiltity of scatterometry towards smaller technology nodes |
| T. Germer NIST, USA | Establishing traceability of scatterometry to the SI meter |
| H. Gross PTB, Germany | Uncertainty estimates for numerically recon-structed profiles of EUV masks |
| P.-E- Hanssen DFM, Denmark | Scatterometry for grating topography parameters determination of buried structures |
| C. Laubis, F. Scholze PTB, Germany | EUV scatterometry and reflectometry for mask metrology |
| H. Megens, A. den Boef, I. Setija ASML, Germany | Metrology of Double Patterning Structures in Lithography |
| H. J. Patrick NIST, USA | Measurement of annealing-induced line shape decay in nanoimprinted polymer films using scatterometry |
| A. Rathsfeld WIAS Berlin | Modelling and algorithms for simulation and reconstruction in scatterometry |
| J. Richter AMTC, Germany | Scatterometry in mask metrology |
| M. Wurm, F- Pilarski, B. Bodermann PTB, Germany | Metrology capabilities and performance of the new DUV Scatterometer of the PTB |